X-ray Photoelectron Spectroscopy (XPS)

Testing Capabilities

X-POWER offers chemical characterization of materials with SIMS and XPS combined on a vacuum system with a load-lock that allows fast introduction of samples into high vacuum.

Potential to Research and Industry Service

• Support research on materials problems in electronic components.
• Support research on degradation testing of components.
• Support research on development of prototypes of new components.

Secondary ion mass spectroscopy (SIMS) is the most sensitive technique for full chemical analysis of materials. A focused primary ion beam sputters secondary ions off the surface of the inspected specimen and the masses of the ions are detected. By gradually sputtering layers off the sample, the SIMS technique can be used to perform depth profiling, for instance in layered systems produced as a series of thin films. With the high compositional resolution of SIMS - typically parts per million - diffusion processes and intermixing of different materials, intended or unintended, can be investigated.

X-ray photoelectron spectroscopy (XPS) mounted on the SIMS system adds surface chemical analysis capabilities. XPS provides information on the chemical and electronic state of the elements, allowing for instance determination of oxidation state.

Key Figures of the XPS System

• System base pressure: 10-9mbar
• Sputtering with Cs ions and gasses allow probing of both organic and inorganic materials
• Sample size: 1x1 cm2
• XPS spectral resolution better than 1 eV
• Small spot, spatial resolution 100 mm